G5 Molybdenum Target
G5 molybdenum target is the latest research and development large-scale display molybdenum target and the specifications is 1700 × 1431 × 14mm. Molybdenum target is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, and ion plating coating, which can applicable to all the plane coating and rotating coating system. Besides, it has a lot of advantages such as high melting point, high conductivity, low specific impedance, good corrosion resistance and good environmental performance.
Molybdenum sputtering target uses ion source to form ions and in the vacuum to accelerate and to assemble high-speed ion flow, which will bombard the solid surface. Besides, the ion and the solid surface will cause kinetic energy exchange, so that the electrons on solid surface will leave the target to deposit on the surface of the substrate and to form nano or micro film.
G5 molybdenum target is mainly used in the display screen, and with the flat panel display requirements, molybdenum target quality requirements should also increase. The density of the molybdenum target not only affects the sputtering rate, but also affects the electrical and optical properties of the film. The higher the molybdenum target density, the better the performance of the film. In addition, increasing the density and strength of the molybdenum target, it can better withstand the thermal stress during sputtering. Therefore, increasing the density of the molybdenum target is one of the important indexes to improve the film performance. Further, high-purity molybdenum sputtering target is conducive to produce high-performance sputtering film and generally the purity of molybdenum sputtering target need to reach at least 99.95%.
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